Plasma-enhanced chemical vapor deposition of indene for gas separation membrane
College
Gokongwei College of Engineering
Department/Unit
Chemical Engineering
Document Type
Article
Source Title
ASEAN Journal of Chemical Engineering
Volume
19
Issue
1
First Page
47
Last Page
53
Publication Date
1-1-2019
Abstract
Polyindene (PIn) Philippines membrane was fabricated onto a zeolite 5A substrate by using plasma-enhanced chemical vapor deposition (PECVD) at low temperature. Membrane characterization was done by taking Scanning Electron Microscopy (SEM) and FT-IR measurements and the new peak was found in the plasma-derived PIn film. Membrane performance was analyzed by checking permeability of pure gases (H2, N2, and CO2) through the membrane. PECVD-derived PIn membrane showed high gas barrier properties and selectivities of 8.2 and 4.0 for H2/CO2 and H2/N2, respectively, at room temperature. © 2019, Gadjah Mada University. All rights reserved.
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Digitial Object Identifier (DOI)
10.22146/ajche.50874
Recommended Citation
Kyaw, M., Mori, S., Dugos, N., Roces, S., Beltran, A., & Suzuki, S. (2019). Plasma-enhanced chemical vapor deposition of indene for gas separation membrane. ASEAN Journal of Chemical Engineering, 19 (1), 47-53. https://doi.org/10.22146/ajche.50874
Disciplines
Chemical Engineering
Keywords
Carbon; Membrane separation; Gas separation membranes
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