Title

Reactive ion etching of NiFe thin films from first-principles study: A case study

College

College of Science

Department/Unit

Physics

Document Type

Article

Source Title

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volume

44

Issue

2

First Page

893

Last Page

894

Publication Date

2-1-2005

Abstract

We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O 2(/NH3,H2) enable the NiFe surface to be etched. © 2005 The Japan Society of Applied Physics.

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Digitial Object Identifier (DOI)

10.1143/JJAP.44.893

Keywords

Magnetic materials; Thin films

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